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Hotplate- OPTIhot HB30+

Artikelnummer: 51-0004-07-00

The future technology in the semi conductor industry and production-
bench mounted Hotplate System for typical lithography baking applications:

OPTIhot HB 30+

  • Bench Mounted Hotplate System for wafer up to Ø 12"
    (Ø 300 mm) and substrates up to 9" x 9" (225 mm x 225 mm)

System consists of:

  • Hotplate System with cover
  • Recipe programmable lifting pins (proximity) for 4" - 12" wafer
  • Recipe programmable Nitrogen (N2) blow
  • 19" controller unit
  • Input display unit with touch panel
  • Preset and calibrated Temperature Controller
  • Including software for PC / Notebook - For more comfortable recipe writing and storage
  • Including an ENGLISH manual on standard paper and a CD-ROM
  • Price without installation and training

Technical data:

  • Voltage: UAC= 110 V / N / PE / 60 Hz / 16A or UAC= 230 V / N / PE / 50 Hz / 16A
  • Temperature range: Up to 300°C - Adjustable in 1°C steps
  • Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
  • Lifting pins (Proximity): From Ø 4" up to Ø 12" - Programmable in 0.1 mm steps
  • Substrate size: Up to Ø 12" (Ø 300 mm) or 9" x 9" (225 mm x 225 mm)
  • Process exhaust: Outer diameter OD 38mm, 30m3/h
  • Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
  • Vacuum: -0.8 ± 0.2 bar
  • Nitrogen (N2): 4.0 ± 0.5 bar
  • CE marked system