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Spin Wet- OPTIwet SB 30 extended

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The future technology in the semiconductor industry and production-
Spin Wet Process System within process:


OPTIwet SB 30 extended

  • Stand - Alone Spin Wet Process System for substrates up to 16“ (Ø 400 mm) and up to 12” x 12” (300 mm x 300 mm)


System consists of:

  • Spinner system with closed process chamber
  • Process chamber made of polypropylene (PP) with safety door
  • Including one programmable electronic media arm – Programmable in speed and position
  • Including Back Side Rinse Nozzle for DI-Water
  • Emergency Stop Button
  • Input display unit with touch screen
  • USB 2.0 port for data exchange
  • Including software for PC / Notebook – For more comfortable recipe writing and storage
  • Including an ENGLISH manual on standard paper and a CD-ROM
  • Price without installation and training
  • Requires at least one chuck
  • Various application possibilities in one spinner system

 
Application possibilities:

  • Rinse and spin drying
  • Development with photo resist
  • Solvent applications (develop / strip)
  • Megasonic – Cleaning
  • High Pressure – Cleaning
  • Brush – Cleaning
  • Piranha – Cleaning
  • Standard – Cleaning 1 (SC 1)
  • Standard – Cleaning 2 (SC 2)
  • HF Last
  • Silicon, Silicondioxid (SiO2) and Silicon Nitride (Si3N4) – Etch applications
  • Various metal etch applications
  • “Lift – Off“


Technical data:

  • Voltage: UAC= 3 x 400 V / N / PE / 50 Hz / 16A
  • Speed: 1 – 4.000 rpm – adjustable in 1 rpm steps (pending on substrate size and load)
  • Acceleration ramp: 1 up to 3.000 rpm/s – adjustable in 1 rpm/s steps (pending on substrate size and load)
  • Spinning time: 1 up to 999 s – adjustable in 0.1 s steps
  • Substrate size: Up to Ø 16” or 12” x 12” (300 mm x 300 mm)
  • Process chamber: Standard made of Polypropylene (PP)
  • Process bowl exhaust:2 x outer diameter OD 110 mm, each 200m3/h
  • Chamber exhaust: 2 x outer diameter OD 140 mm, each 300m3/h
  • Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
  • Vacuum: -0.8 ± 0.2 bar
  • Nitrogen (N2): 4.0 ± 0.5 bar
  • Media drain connection to the house drain
  • CE marked system