ATMgroup

产品规格

Spin Wet- OPTIwet ST 75

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The future technology in the semiconductor industry and production-
Spin Wet Process System within process:

OPTIwet ST 75

  • Stand - Alone Spin Wet Process System for substrates up to Ø 750 mm or up to 20” x 20” (508 mm x 508 mm)

System consists of:

  • Stand - Alone cabinet with all process modules integrated
  • Process chamber made of polypropylene (PP) safety door
  • Including one programmable electronic media arm – Programmable in speed and position
  • Including Back Side Rinse nozzle for DI-Water
  • Emergency Stop Button
  • Input display unit with touch
  • USB 2.0 port for data exchange
  • Including software for PC / Notebook – For more comfortable recipe writing and storage
  • Including an ENGLISH manual on standard paper and a CD-ROM
  • Price without installation and training
  • Requires at least one chuck
     

Technical data:

  • Voltage: UAC= 3 x 400 V / N / PE / 50 Hz / 32A
  • Motor speed: 1 – 1.200 rpm – Adjustable in 1 rpm steps (pending on substrate size and load)
  • Motor acceleration ramp: 1 up to 150 rpm/s – Adjustable in 1 rpm/s steps (pending on substrate size and load)
  • Spinning time: 1 up to 999 s – Adjustable in 0.1 s steps
  • Substrate size: Up to 30” (Ø 762 mm) oder 20” x 20” (508 mm x 508 mm)
  • Process chamber: Standard made of Polypropylene (PP)
  • Process bowl exhaust:Outer diameter OD 110 mm, 200m3/h
  • Chamber exhaust: 2 x outer diameter OD 140 mm, each 300m3/h
  • Cabinet exhaust: Outer diameter OD 110 mm, 200m3/h
  • Controller exhaust: Outer diameter OD 110 mm, 200m3/h
  • Media drain connection to the house drain
  • Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
  • Vacuum: -0.8 ± 0.2 bar
  • Nitrogen (N2): 4.0 ± 0.5 bar
  • CE marked system