ATMgroup

产品规格

Spin coating and Cleaning-OPTIspin ST20

产品编号: 51-0002-03-00

The future technology in the semiconductor industry and production-
Stand Alone Spinner system for coating, cleaning and developing within process:

OPTIspin ST 20

  • Stand - Alone Spinner System for Coating, Cleaning or Developing applications for wafer up to Ø 8" (Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)

System consists of:

  • Stand - Alone cabinet with all process modules integrated
  • Spinner system with process bowl cover (hardware interlock secured)
  • Multi piece process bowl (easily dismountable for cleaning purposes) with splash ring
  • Input display unit with touch
  • USB 2.0 port for data exchange
  • Including software for PC / Notebook - For more comfortable recipe writing and storage
  • Including an ENGLISH manual on standard paper and a CD-ROM
  • Price without installation and training
  • Requires at least one chuck (Not included !)

Technical data:

  • Voltage: UAC = 3 x 400 V / N / PE / 50 Hz (60 Hz) / 16A
  • Motor-Speed: 1 up to 10,000rpm* in 1rpm steps
  • Motor-Acceleration ramp: 1 up to 50,000 rpm/sec* in steps
  • 1rpm/sec *(depending on substrate size and load)
  • Spinning time: 1 up to 999 s - Adjustable in 0.1 s steps
  • Substrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
  • Process bowl Standard made of Polypropylene (PP)
  • Process exhaust: Outer diameter OD 110 mm, 200m3/h
  • Cabinet exhaust #1: Outer diameter OD 110 mm, 200m3/h
  • Cabinet exhaust #2: Outer diameter OD 110 mm, 200m3/h
  • Drain: 5 liter waste tank and high-level sensor, inside the cabinet
  • Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
  • Vacuum: -0.8 ± 0.2 bar
  • Nitrogen (N2): 4.0 ± 0.5 bar
  • CE marked system

Chucks: Option

Dispense: Option

Nozzle: Option

Hotplate: Option