ATMgroup

产品规格

Hotplate- OPTIhot HB20

产品编号: 51-0004-01-00

The future technology in the semi conductor industry and production-
bench mounted Hotplate System for typical lithography baking applications:

OPTIhot HB 20

  • Bench Mounted Hotplate System for wafers up to Ø 8" (Ø 200 mm)and substrates up to 6" x 6" (150 mm x 150 mm)

System consists of:

  • Hotplate System with cover
  • Lifting pins after process for 2" - 8" wafer
  • Input controller
  • Preset and calibrated temperature controller
  • Including an ENGLISH manual on standard paper and a CD-ROM
  • Hotplate System with cover and controller
  • Price without installation and training

Technical data:

  • Voltage: UAC= 110 V / N / PE / 60 Hz / 16A or UAC= 230 V / N / PE / 50 Hz / 16A
  • Temperature range: Up to 300°C - Adjustable in 1°C steps
  • Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
  • Substrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
  • Process exhaust: Outer diameter OD 38 mm, 30m3/h
  • Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
  • Vacuum: -0.8 ± 0.2 bar
  • Nitrogen (N2): 4.0 ± 0.5 bar
  • CE marked system

Hotplate: Option